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1. Dr. Shoutian Li

   ...ty, Richmond, Virginia, USA in 1998. He is a senior principle scient...

   Basic page - 2025-12-02 15:04:19.0

2. Symposium II Lithography and Patterning

   ...tion for 28 nm hole pattern in 193 nm topcoat-free immersion lithogr...

   Basic page - 2017-04-07 14:59:45.0

3. Symposium III Dry &Wet Etch and Cleaning

   ...vement with Plasma Coating for 193nm Lithography   Erhu Zheng, ...

   Basic page - 2024-12-04 15:02:36.0

4. Symposium IV Thin Film, Plating and Process Integration

   ...bsp; Vijay Narayanan, IBM *8:55-9:20 14nm metal gate film stack deve...

   Basic page - 2017-04-07 15:04:24.0

5. Symposium V CMP and Post-Polish Cleaning

   ...Chul Yang, Globalfoundries 8:55-9:10 SiOC CMP Developed and Implemen...

   Basic page - 2017-04-07 15:06:47.0

6. Symposium VI Metrology, Reliability and Testing

   ... Lanza, Soochow University 8:55–9:10 Effective Method to Automatical...

   Basic page - 2017-04-07 15:08:52.0

7. Symposium VII Packaging and Assembly

   ...alcomm Germany RFFE Gm bH *8:55-9:15 The Development of Wafer Level ...

   Basic page - 2017-04-07 15:13:15.0

8. Symposium VIII MEMS, Sensors and Emerging Semiconductor Technologies

   ...l Littan , Intermolecular *8:55-9:20 Neutral Beam Technology for Fut...

   Basic page - 2024-12-04 15:05:29.0

9. Symposium IX Circuit Design, Systems and Applications

   ... Remarks   Yiyu Shi **8:35-9:05 Design Technology Co-optimizati...

   Basic page - 2017-04-07 15:18:58.0

10. Symposium I: Device Engineering and Memory Technology

    ...en Technology Co., Ltd. *08:55-09:20 RRAM-based In-memory Computing ...

    Basic page - 2025-03-31 15:29:17.0