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Symposium V: CMP and Post-Polish Cleaning (2018)
...OBALFOUNDRIES US *14:25-14:50 Defect control for high k metal ga...
Basic page - 2018-04-17 11:45:51.0
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Symposium VI: Metrology, Reliability and Testing (2018)
...test (China) Co., Ltd. 14:35–14:50 Achieving Mastery in Chip Manufact...
Basic page - 2018-04-17 11:46:46.0
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Symposium VII: Packaging and Assembly (2018)
...elite (Suzhou) Co., Ltd. 9:35-9:50 Thermal and Mechanical Performance...
Basic page - 2018-04-17 11:47:34.0
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Symposium VIII: MEMS, Sensors and Emerging Semiconductor Technologies (2018)
...Jeehwan Kim, MIT, USA *14:25-14:50 Research Achievements of Key Techn...
Basic page - 2018-04-17 11:48:28.0
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Symposium IX: Design and Automation of Circuits and Systems (2018)
...iversity of Notre Dame 15:35-15:50 CELLULAR NEURAL NETWORK (CENN) FPG...
Basic page - 2018-04-17 11:49:26.0
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Prof. Peide Ye
...200 peer reviewed articles and 350 conference presentations including...
Basic page - 2018-10-09 13:57:47.0
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Prof. Bin Gao
...s total citations greater than 3500. He was awarded IEEE EDS PhD Stud...
Basic page - 2018-10-16 12:58:40.0
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SEMI Industry Gala
...n. SEMI China invites more than 500 executives from semiconductor, hi...
Basic page - 2020-04-27 17:45:04.0
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Grand Opening Keynote
... 14:00 – 14:10 The 50th Anniversary Ceremony of SEMI &nb...
Basic page - 2024-09-10 20:39:57.0
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Prof. Weisheng Zhao
...nt five years, He has published 50 JCR Q1 papers as the first or the ...
Basic page - 2018-10-31 13:26:41.0