Date: Monday, March 12, 2018
Venue: Shanghai International Convention Center
Room: 5F


CMOS Technology Challenges and Opportunities for FINFET and Beyond
Dr. Dechao Guo
Sr. Manager, IBM


BEOL Interconnect Technology: Scaling Trends and Opportunities
Dr. Griselda Bonilla
Sr. Manager, IBM

Defect characteristics and yield control for 14nm to 10nm CMOS technology
Dr. Kan Chen
Sr. Manager, KLA Tencor

Tutorial 2   会议议程