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Dr. Yanli Li graduated from Fudan University in 2015, and worked for SMIC, ICRD and the now Fudan University. She has experience in the developing of logic photolithographic process for the 28 nm, 14 nm, 10nm and 5 nm technological nodes. She has authored or co-authored 22 technical papers in photolithography and 68 patents. Among these patents, two have been granted with one US patent. She won the second prize of outstanding young engineer of CSTIC 2020 and outstanding young scholar paper of ICSICT 2022. In 2024, she published a monograph on photolithography technology called 《Advanced lithography process R&D methodology and procedures in modern integrated circuit factories》.
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