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Dr. Srishti Chugh is a semiconductor process engineering professional and researcher with over
a decade of experience in atomic layer deposition (ALD), advanced thin-film materials,
semiconductor process integration, and high-volume manufacturing. She currently serves as a
Staff Process Engineer at Kepler Computing Inc., focusing on the development and optimization
of advanced thin-film deposition processes for semiconductor applications.
Her professional and research experience spans the semiconductor industry, national
laboratories, and academic institutions, with previous positions at Eugenus Inc., Oxford
Instruments, and CSIR–National Physical Laboratory. Her technical contributions include the
development of 300 mm ALD processes for titanium silicon nitride (TiSiN), optimization of
conformal thin-film deposition in high-aspect-ratio structures, and process qualification and
technology transfer for advanced semiconductor manufacturing.
Dr. Chugh is a named inventor on two issued U.S. patents related to titanium nitride-based thin
films and deposition methods. Her research has been published in internationally recognized
peer-reviewed journals, including ACS Applied Materials & Interfaces, Journal of Materials
Chemistry C, and Journal of Vacuum Science & Technology. Her research on graphene-based
hybrid electronic materials was also selected for the cover of ACS Applied Materials &
Interfaces.
She earned her Ph.D. in Materials Science and Engineering from the University of Texas at El
Paso. An IEEE Senior Member and IOP Trusted Reviewer, Dr. Chugh contributes to scientific
peer review in semiconductor processing, thin-film technologies, and electronic materials.
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