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Damon Deng 邓萌萌 Founder & CEO, Prinano Technology (Hangzhou) Co., Ltd. 璞璘科技（杭州）有限公司，创始人CEO |
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讲师简介 / Speaker Bio University of Science and Technology of China (USTC), with academic and professional experience at The University of Hong Kong. Began entrepreneurship in 2016; previously served as China Operations Director at Nanodevice Solutions Inc. and Vice Chairman of Hangzhou Tannano Technology Co., Ltd. Earlier career includes positions at the Suzhou Institute of Nano-Tech and Nano-Bionics (Chinese Academy of Sciences) and San’an Optoelectronics. Over 10 years of experience in micro/nanofabrication and nanoimprint lithography (NIL) Extensive background in project management and operations of high-tech micro/nano enterprises Author of multiple publications in micro/nanofabrication; holds nearly 30 industry-related patents, including one U.S. invention patent 摘要 / Abstract Since its invention in 1995, nanoimprint lithography has been capable of patterning at sub-10 nm resolution. After thirty years, it now offers broad prospects across many industries, especially in semiconductors. In 2019 Canon announced that it had used nanoimprint technology to validate the fabrication of 3-D NAND memory chips, bypassing EUV lithography entirely and cutting energy consumption to 1/10 and costs to 1/3 of EUV. Moreover, in Q4 2024 Canon delivered the world’s first production-ready nanoimprint lithography system to a customer in Texas; the system is targeted at manufacturing NAND and DRAM memory devices. In compound semiconductors, nanoimprint has already displaced Stepper lithography as the primary means of boosting yield and reducing cost in LED-chip fabrication. For optical semiconductors, nanoimprint is equally competitive: SiC-based optoelectronics have now adopted nanoimprint lithography at scale for both development and high-volume production. |
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