|
Yasin Ekinci is head of the Advanced Lithography and Metrology group at Paul Scherrer Institute. He received his Bachelor degree in Physics at Middle East Technical University, Ankara, Turkey in 1997; his Master's degree in Engineering Sciences in University of De Montfort, Leicester, UK, in 1999. He obtained his PhD in Max-Planck Institute for Dynamics and Self-Organization, Göttingen, Germany in 2003. In 2004, he joined Paul Scherrer Institute as a postdoctoral researcher. Between 2006 and 2012 he worked as a postdoctoral researcher and subsequently as a senior scientist and a lecturer in Department of Materials at ETH Zürich. He is at Paul Scherrer Institute since 2009 and leading the XIL-II beamline at Swiss Light Source. Since 2016, he is head of the Advanced lithography and Metrology group and since 2018, acting head of the Laboratory for Micro and Nanotechnology.
He worked on various topics of nanoscience and technology, including atom optics, surface science, EUV lithography, resist materials, coherent scattering, lensless imaging, plasmonics, metamaterials, biosensing, semiconductor nanostructures and nanofluidics. He is author/co-author of about 180 papers and 5 patent applications. He received Young investigator of the year award of Swiss Society for Optics and Microscopy in 2009. He is a fellow of SPIE.
|
