David P. Huang
Director, the LTD (Logic Technology Development) Group
Intel, USA

Dr. David Huang is currently working for Intel as a director in the LTD (Logic Technology Development) group in USA. He was working for Pall Corporation as a Vice President, Technical Service. His previous position at Pall was a Global Sr. R&D Director, developing filtration & separation products for microelectronics including semiconductor, photovoltaic, LED and FPD industries. Prior to joining Pall, he worked for Praxair as the Director of CMP R&D.

His expertise covers computer chip and hard drive R&D, new consumable product development and commercialization (CMP pad & slurry, filter for semiconductor and high tech industry), with hands on experience on CMP process, equipment and industrial consumables, process integration and R&D management from Intel (computer chip maker), Seagate (hard drive industrial leader) and Praxair (CMP pad and slurry). He also devoted himself in fundamentals study of materials science for eight years as a researcher at the Materials Science Institute, Italian Academy of Science (CNR) and Lawrence Laboratory at University of California at Berkeley.

Dr. Huang received his PhD in Materials Science & Engineering from the University of California at Berkley, completed a MBA program sponsored by CSIRO/BHP in Sydney, Australia, and Innovation Leadership at MIT USA. He was the winner of the prestigious IAA 2000 (Intel Achievement Award). Dr. Huang holds several patents in material separation, magnetic thin film head design, and new polymer chemistry worldwide, published papers in prestigious journals, gave seminars to universities, and keynote / invited talks to international conferences. He was serving as an executive committee member of several major international conferences in semiconductor technology both in the US and overseas.