| Date: | 15:30-17:00, March 18, 2024 |
| Meeting Room: | 5B+5C |
| Shanghai International Convention Center | |
 |
Topic: Thin Film Deposition for IC Processing Technology
Speaker: Dr. Chao Zhao Abstract: In this 90 minutes tutorial, the deposition of thin films for IC processing will be presented, including a short introduction to the types of the thin films used for CMOS FEOL and BEOL process and memory manufacturing (DRAM and 3D-NAND), fundamental of plasma technology, PVD (Sputtering, Evaporation, PLD and IBD), CVD（Thermal and PECVD）, ALD and epitaxy. The lecture will discuss not only the concept of deposition methods, for instance, different sputtering (DC-, Magnetron-, RF-, pulsed sputtering), but also detailed processing techniques such as Ionized metal plasma, self-ionized plasma etc. The examples of typical applications as enablers of device scaling will be given as well, such as ALD of high-k/metal gate, MIM dielectric and epitaxy of Si/SiGe multi-layers.Biography: Dr. Chao Zhao is working as the Senior VP of Beijing Superstring Academy of Memory Technology (SAMT). In 1982, he graduated from Physics Department of Nanjing University in China with a Bachelor Degree. He received a master degree from University of Industry of Harbin in Semiconductor in 1988 and a PHD degree from University of Leuven in Belgium in 1999. From 2000 to 2010, he was working as a senior scientist in IMEC and from 2010 to 2020, a full professor of Integrated Circuit Advanced Process Center of Institute of Microelectronics of Chinese Academy of Science (IMECAS) and University of CAS. His research experience covers R&D of CMOS processing and DRAM manufacturing. He has authored and co-authored 330 scientific papers, 3 book-chapters and 1 book, and been issued 180 invention patents in IC processing technology. |