Advanced Manufacturing Forum
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Date:
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Thursday, March 18, 2021
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Time:
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09:00-12:00
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Venue:
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Pudong Ballroom 1+2+3, Kerry Hotel Pudong, Shanghai
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Attendee Registration Previous Review
It has been 62 years since the invention of integrated circuits. Driven by Moore's law, the width shrinks every year and the performance keeps improving, the high-end market is occupied by 7nm, 10nm, 14/16nm, 5nm will be mass production in TSMC soon, Intel's 7nm process going well and 5nm is under develop. Finfets have been invented for years, can new technologies like the negative capacitance field effect transistor (NCFET) continue to drive the industry? In this forum, we will invite Foundry, Ecosystem companies to discuss together.
SPONSORS
Agenda / 议程
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09:00– 09:20
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Registration 来宾登记
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Moderator/主持人
Ruosong Xu 徐若松
General Manager & Lega Representative, Cymer Semiconductor Equipment (Shanghai) Co.,Ltd
西盟半导体设备（上海）有限公司, 总经理兼法人代表
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09:20 – 09:45
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Processes and Equipment Solutions in 3D IC Manufacturing
三维集成领域设备工艺解决方案
王娜
Vice President of Strategic Development, NAURA
北方华创战略发展副总裁
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09:45 – 10:10
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Reaching New Heights: Intel 3D NAND Technology
Donghui Lu, Ph.D 卢东晖博士
Vice President, NAND Design, Technology and Manufacturing Group, Intel
英特尔副总裁，存储设计, 技术, 和研发部
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10:10 – 10:35
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打造基于策略和能力中心的先进半导体制造系统
Luke Liu 刘志农
SVP, UNISOC (Shanghai) Technologies Co., Ltd
紫光展锐（上海）科技有限公司, 高级副总裁
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10:35 – 11:00
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以资本市场国际合作促进国内先进制造生态链建设
LEE BYUNGDUCK 李丙德
Director, Venture Investment,Skhynix
海力士, 产业投资首席
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11:00 – 11:25
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Chip revolution from GMT to LMC method and EDA development direction
从GMT到LMC的芯片技术进步和EDA发展新方向
何进
北京大学教授，博士，北京大学深圳系统芯片设计重点实验室主任
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11:25 – 11:50
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国产离子注入设备发展路径探讨
Junyu Xie 谢均宇
vice general manager, Beijing Zhongkexin Electronics Equipment Co., Ltd
北京烁科中科信电子装备有限公司，副总经理
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11:50 – 12:00
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Lucky Draw, Edwards Marketing directorHunt Fan，3 Huawei Mate30EPro(5G)
幸运抽奖，埃地沃兹 中国区市场总监范俪仁， 3台 Huawei Mate30EPro(5G)
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* The agenda and guests are subjected to adjust without notice.
