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Naoya Hayashi received his BS degree in applied chemistry, and MS degree in electronic chemistry from Tokyo Institute of Technology, Tokyo, Japan. He joined Dai Nippon Printing Co., Ltd. (DNP) in 1977. He has been responsible for development of photomask technologies for more than 40 years at DNP, such as electron beam exposure systems, resist materials and processes, phase-shifting materials, NGL masks for EUV and Nanoimprint, and DFM (Design For Manufacturability) technology. He is the first Research Fellow of DNP since 2007.
He was recognized a SPIE Fellow in 2011.
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