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Dr. Hideaki Tsubaki is the Manager in the photoresist development group at FUJIFILM corporation. He joined Tokyo Institute of Technology and received the PhD in 2004.
Then he joined FUJIFILM R&D management headquarters. He involved ArF immersion resist development for 4 years and invented NTI process which becomes industry standard for next generation lithography. In 2008-2015, he led the early development of EUV resist and played a major role in improving RLS tradeoff relationship toward high-volume manufacturing. In 2016-2021, he investigated a high resolution thick KrF resist for CIS and 3D-NAND memory as a manager. Since 2022, he has been developing a novel photoresist for next generation lithography. He has published 18 papers and over 150 patents, and has received the Chemical Society of Japan CSJ Award for Technical Development in 2015.
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