Aris MA

Dr. Aris Ma received BE from Tsinghua University in Materials Science in 1992 and PhD from University of Minnesota (Twin Cities) in Electrical Engineering in 2000. He worked for PDF Solutions (San Jose, CA USA) as an IC yield consultant and engagement manager until 2005. In 2010, he founded BeiOptics (Beijing China), a metrology and inspection tool maker for IC and LED industry. He is currently the CEO of the company. Dr. Ma has over 10 publications and holds 30 domestic and international patents 

Abstract:
MOCVD for Silicon substrate and other power devices received great attentionss in the past several years. Compared to Sapphire substrate, growing epi layer on Si posed new challenges for the in-situ monitoring tool. This presentation is intended to discuss some of the challenges and introduced BeiOptics’ new product and/or features to address these challenges.