Mr. Wenzhan Zhou

Director (Advanced Module Lithography Technology Development),
Shanghai Huali Microelectronics Corp

Photolithography (deep submicron); Expert at resist process and imaging system (i-line, KrF, ArF dry and wet system) optimization.
Strong background in R&D with optical lithography simulation and modeling (using Prolith and S-Litho), Familiar with Optical Proximity Correction Algorithm and Application;
Enthusiastic, motivating leadership and good coordinator for cross department task;
Proven self-starting ability;
Great communication skill;

Master of Science. Physics, 1997-2000, National University of Singapore.
Thesis: "Growth and Characterization of Ag doped YBCO Superconducting Thin Film by Dual-beam Pulsed Laser Deposition"

Bachelor of Science. Physics, 1991-1996, Fudan University, Shanghai, P.R. China
Thesis: "Modulated Spectrum of Semiconductor Materials"


Nov 2018 – Present Shanghai Huali Microelectronics Corp
Director (Advanced Module Lithography Technology Development)

September 2015 – Nov 2018 Samsung Austin Semiconductor Ltd
Staff Engineer/Deputy Director (Advanced Lithography Process Control and Development)

September 2012 – Sep 2015 Taiwan Semiconductor Manufacturing Corp Ltd
Manager (Advanced Lithography, Research Development Process Center)

April 2010 – September 2012 Globalfoundries Singapore Pte Ltd
Senior Member of Technical Staff (Advanced Lithography Research)

April 2006 – April 2010 GlobalFoundries Singapore Pte Ltd
Section Manager of Advanced Lithography

Sep 2002 – April 2006 UMCi Ltd. (UMC Fab12i)
Principle Process Engineer (LTPE2 group leader), MTD group

June, 1999 – Sep 2002 Chartered Semiconductor Manufacturing Ltd. Fab 3/SMP, Singapore
Senior Process Engineer, Litho Module

Jan, 1999 – June, 1999 Siemens Masushita Components Pte Ltd (Singapore) Lithography Module

Jan, 1997- 1999 Research Scholar in the Department of Physics, National University of Singapore

1996 – 1997 Philips Semiconductor (Shanghai) Ltd. Lithography Module