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Dr. Jae Hwan Sim is a Principle Investigator for DuPont Electronics & Industrial within their Semiconductor Technologies Lithography business located at the DuPont Korea Technology Center in Hwaseong, South Korea. He received his PhD in Chemistry from Seoul National University in 2010 and then joined DuPont Electronics &Industrial (former Dow Electronic Materials) in 2011 as a Senior Chemist following a one year post-doctoral research position at the National Institute of Standards and Technology Material Science and Engineering Lab in Gaithersburg, MD as a guest researcher. Since 2011, Dr. Sim has focused his scientific career at DuPont on developing a wide array of technologies to include novel gap-filling materials, bottom antireflective coatings (BARCs), and Extreme Ultraviolet (EUV) underlayers to enable complicated, high-resolution photolithographic processes. He is a named inventor on over 15 granted patents and has contributed to the successful commercialization of over 10 new materials that are widely used in in the fabrication of advanced semiconductor devices that are used to in electronics all around the world.
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