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Dr. Burn J. Lin holds Distinguished Research Chairs at the National Tsing Hua University, National Chiao Tung University, and National Taiwan University, and a Directorship at the National Tsing Hua University. From 2011 to 2015 he was a Vice President and the Distinguished Fellow at TSMC, Ltd., which he joined in 2000 as a Senior Director. Earlier he held various technical and managerial positions at IBM in the US, after joining in 1970. He has been extending the limit of optical lithography for half a century. He founded Linnovation, Inc. and is still the founding CEO of the company.
Dr. Lin is a member of the US National Academy of Engineering, Academician of Academia Sinica, ITRI laureate, IEEE Fellow, and SPIE Fellow, Distinguished alumnus of Ohio State University and National Taiwan University.
He received the Future Science Award from China in 2018.
2013 IEEE Nishizawa Metal.
2009 IEEE Cledo Brunetti Award.
2009 Benjamin G. Lamme Meritorious Achievement Medal from OSU.
2006 Distinguished Optical Engineering Award of the Optical Engineering Society of the Republic of China.
2004 1st recipient of SPIE Frits Zernike award.
2 TSMC Innovation Awards, 10 IBM Invention Awards, and an IBM Outstanding Technical Contribution Award.
Dr. Lin has written 2 books and 3 book chapters, published 133 articles, and holds 78 US patents.
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