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1. Symposium III: Dry &Wet Etch and Cleaning(2022)

   ...on Xiaohui Li, Naura, China 200/150/100mm Compatible, ICP and CCP Etc...

   Basic page - 2022-09-27 09:52:01.0

2. Symposium VI: Metrology, Reliability and Testing(2022)

   ...o Moisture Diffusion Based on 0.153um CMOS Zhengyu Lin, Southeast Uni...

   Basic page - 2022-09-27 09:53:11.0

3. Symposium IX: Design and Automation of Circuits and Systems(2022)

   ...M-based DNN accelerators (14:30-15:00, June 17, Microsoft Teams Meeti...

   Basic page - 2022-09-27 09:54:14.0

4. Jiaping Shao / 邵嘉平

   ... 学士 博士 、复旦大学博士后、Cornell康奈尔EMBA。 15年光电半导体销售&市场以及技术管理经验，曾任职Cree中国区营...

   Basic page - 2022-08-11 14:02:57.0

5. Symposium II: Lithography and Patterning(2021)

   ...sp; to designate regular talk - 15 min Sunday, March 14, 2021 Shangha...

   Basic page - 2022-09-29 10:12:07.0

6. Symposium IV: Thin Film, Plating and Process Integration(2021)

   ...sp; to designate regular talk - 15 min Sunday, March 14, 2021 Shangha...

   Basic page - 2022-09-29 10:16:20.0

7. Symposium III: Dry & Wet Etch and Cleaning(2021)

   ...sp; to designate regular talk - 15 min Sunday, March 14, 2021 Shangha...

   Basic page - 2022-09-29 10:14:36.0

8. Symposium V: CMP and Post-Polish Cleaning(2021)

   ...sp; to designate regular talk - 15 min Sunday, March 14, 2021 Shangha...

   Basic page - 2022-09-29 10:17:54.0

9. Symposium VI: Metrology, Reliability and Testing(2021)

   ...sp; to designate regular talk - 15 min Sunday, March 14, 2021 Shangha...

   Basic page - 2022-09-29 10:19:12.0

10. Symposium VII: Packaging and Assembly(2021)

    ...Turner, Applied Materials 14:50–15:05 Next Generation High Performanc...

    Basic page - 2022-09-29 10:21:04.0