Dr. Sherman Hsu
Global R&D Head, Avantor


C Sherman Hsu, Ph.D., serves as a Technical Fellow and Global Head, Clean Technology at Avantor. Current programs focus on products for advanced semiconductor technology nodes of 5nm and beyond, including high-performance implant photoresist strip, residue clean, selective etch, surface preparation and Ge/III-V integrations. With more than 25 years in research, Hsu has established a series of Cu and low-k compatible cleaning chemistries and novel techniques that include supercritical fluid cleans in microelectronics and nanoelectronics. His recent work on selective etchants and cleaners provide fine profile tuning, surface conditioning and integration of a wide range of materials in FEOL, MOL and BEOL applications. Hsu received a Ph.D. degree in Chemistry from Cornell University, Ithaca, NY, USA. He has authored more than 50 patents, publications and conference presentations.