Mr. Masahiro Sumiya
Hitachi High-Technologies Corp., Japan

Masahiro Sumiya is currently the senior research engineer of R&D division in Hitachi High-Technologies Corp, Japan. He received his M.S. in science from University of Tsukuba, Japan. He has conducted research in plasma etching from 1995. He joined University of Maryland, MD, USA. as a visiting researcher from 2006 to 2007. During this stay, he was working on studying the mechanism of photoresist degradation by plasma exposure. His research is focused on developing the plasma etching reactor and its etching process for recent nanometer scale device.