Joseph Ervin
Senior Director, Semiconductor Software Products, Lam Research

摘要 / Abstract

In this talk, we will discuss innovative concepts to address next-node semiconductor manufacturing challenges. These concepts include virtual process modeling, virtual metrology, virtual process optimization using design of experiments (DOEs), supervised image measurement, and advanced sensor-based equipment control. Machine learning is being used in many of these technology domains and is driving real-time feed-forward and feedback optimization to deliver significant improvements in semiconductor manufacturing.