Date: 15:30-16:30 on June 27, 2023

Topic: Post CMP Cleaning

Speaker: Jin-Goo Park, Professor of Hanyang University, Korea


Below 10 nm below devices, post CMP cleaning became one of the most challenging processes due to the drastic reduction of defect size and allowed impurity metal ion concentrations. Another factor is the application of the 30 years old PVA brush scrubbing technology in post CMP cleaning, which is very different from FEOL wet cleaning processes. No efforts and research have been carried out last 30 years since there were no yield issues due to the post CMP cleaning. This tutorial will review a brief history of CMP technology with cleaning technology with the fundamentals of scrubbing cleaning mechanisms. The focus will be placed on PVA brushes, their synthesis methods, and their strength and weaknesses with future direction on post CMP cleaning technology.


Professor Jin-Goo Park received B.S degree from Hanyang University, Korea in 1984 and the M.S. and Ph.D. in materials science and engineering from the University of Arizona in 1998 and 1993, respectively. From 1992 to 1994, he was with Texas Instruments, Dallas, TX, where he was responsible for microcontamination control in semiconductor wet processing and DMD (Digital Micromirror Display) development. In 1994, he joined Hanyang University ERICA, where he is now a professor in the Department of Materials and Chemical Engineering as well as a Director of Electronic Materials and Processing Lab (EMPL). His research interests include wafer cleanings, EUV/pellicle cleaning and chemical mechanical polishing with post CMP cleaning. He has authored more than 400 technical publications/presentations in the area of wafer cleanings and CMP. He is the past president of Korea CMPUGM and a founder and president of International Conference on Planarization/CMP Technology (ICPT) which is the largest CMP conference in the world. He is also a founder of Korea Surface Cleaning Users Group Meeting. He has served as a vice dean of Graduate School of Hanyang University and a review board member of Korea Research Foundation. He is now a member of the National Academy of Engineering of Korea (NAEK) which is the most honorable membership for engineering field in Korea. He may be reached at 82-31-400-5226 or by email [email protected].