Symposium Chair: Dr. Xiaowei Li, ICT, CAS, China


** to designate keynote talk - 30 min      
* to designate invite talk - 25 min
  to designate regular talk - 15 min

Sunday, March 22, 2026, Kerry Hotel Pudong, Shanghai
Meeting Room: Function Room 2


Session I: Test
Session Chair: Xiaowei Li
13:30-13:35 Opening Remarks
 
**13:35-14:05 Strategy and Demonstration of FPGA-based Automated Test above 100 Gbaud per Lane
  David Keezer, Eastern Institute of Technology
14:05-14:20 Best Implementation Strategy of PS5000 in Smart TV Chip Testing
  Chelsea Zhou
14:20-14:35 High-Speed ADC CLK Optimization Using Advantest V93K Wave Scale Precision Source
  Ya Gao, Advantest (China) Co.,Ltd
14:35-14:50 Oscillation Mechanisms in Laser-Sustained Plasma Light Sources for Semiconductor Inspection
  Yangyang Fu, Tsinghua University
14:50-15:05 Power Test Solutions for Charger Device On Advantest V93000
  Saijin Ge, Advantest
15:05-15:20 Break Through the Test Challenges for the Satellite Terminal SoC Chips On V93000
  Bank Liu, Advantest



Session II: Test and Reliability
Session Chair: David Keezer
*15:20-15:45 Design for Testability and ATPG Based on Software-Defined LFSR
  Dong Xiang, Tsinghua University
15:45-16:00 The Impact of Drain Bias on Advanced High-k Metal-gate TDDB Reliability
  HuaMeng Wang, Sanechips Technology Co., Ltd.
16:00-16:15 A dual-mode X-ray Diffraction Metrology System with Parallel and Convergent-beam capabilities
  Yankun Sun, Shenzhen Angstrom Excellence Semiconductor Technology Co. Ltd
16:15-16:30 Cloud-IoT Enabled Real-time ML for Semiconductor Test Optimization in OSAT Environments
  Fangmin Chu, Advantest
16:30-16:45 Coffee Break
16:30-18:00 Panel Discussion (Meeting Room: Pudong Ballroom 1)



Monday, March 23, 2026, Kerry Hotel Pudong, Shanghai
Meeting Room: Function Room 2

Session III: Reliability
Session Chair: Xiaowei Li
*08:35-09:00 Reliability and Test Challenges for Multi-Core Cyber-Physical Systems
  Zebo Peng, Linkoping University
09:00-09:15 Analysis of the Impact of SACQ Solder Balls and High-Reliability Solder Paste on Board-Level Temperature Cycle Life
  Yunong Zhao, Sanechips Technology Co., Ltd.
09:15-09:30 Failure Analysis and Localization of CDM Induced Micro Damage in High Speed I/O of Advanced FinFet Nodes
  Caiyun Ren, Shanghai X-Ring Technology Co., Ltd.
09:30-09:45 Analysis of Chip Failure Caused by Misoperation in HTOL Test
  Haitao Liu, Sanechips Technology Co. Ltd.
09:45-10:00 High sensitivity and quantitative differential interference contrast measurement and verification by using nm-scale shallow and smooth-shaped defects
  Shogo Iguchi, Hitachi High-Tech Corporation, Japan
10:00-10:15 Coffee Break



Session IV: Metrology
Session Chair: Dong Xiang
*10:15-10:40 AI 4 Sensors: On New Integration and Testing Paradigm of Sensing and Intelligence
  Jia Li, Institute of Microelectronics, CAS
10:40-10:55 Analysis of Metallic Contaminants on SiC wafer with Innovative Extraction Method
  Lihua Tao, Huaying Research Co.,Ltd
10:55-11:10 Nondestructive Depth Measurement of High-Aspect-Ratio Microstructures with Ultra-Small Linewidth
  Zizheng Wang, Tianjin University
11:10-11:25 Advanced Metrology for Backside Metallization Using Picosecond Laser Ultrasonics
  Johnny Dai, ONTO Innovation
11:25-11:40 Effect of Barrier Process on TDDB for Cu/ULK BEOL Structures
  Yue Wu, GTA Semiconductor Co., Ltd.
12:00-13:30 Lunch Break



Session V: Advanced Technology
Session Chair: Zebo Peng
**13:30-14:00 Architecting for Jagged Intelligence
  Qiang Xu, The Chinese University of Hong Kong
*14:00-14:25 AI-Assisted Full-Flow Digital Chip Design
  Jing Ye, CASTEST Co., Ltd.
14:25-14:40 Strategic Evolution of Metrology & Inspection (MI) in the AI Era: Transitioning to Intelligent, Data-Driven Process Control
  Byoung-Ho Lee, Hitachi High-Tech Corporation, Japan
14:40-14:55 A Review of Recent Technological Advancements in Corona Noncontact Metrology Tools, CnCV, for Industrial WBG Wafer Testing and Electrical Defect Related Yield Prediction
  Marshall Wilson, ONTO Innovation
14:55-15:10 Two-stage Threshold Voltage Shift Effects of ZnO Thin-film Transistors under Ultraviolet Irradiation
  Aoran Xu, Peking University
   
15:10-18:00 Coffee Break
16:00-18:00 Poster Session: Monday, March 23 (3F, Kerry Hotel Pudong, Shanghai)
  eFuse Test Implementation via Protocol Access on V93000
  Ying He, Advantest
  Using "Conditional Go To" on V93000 XPS256 for Trimming Test
  Ying He, Advantest
  Thermo-Mechanical Analysis of CNT-Cu Filled TSVs with Varying Geometric and Material Parameters
  Ziyao Luo, Shanghai University
  High Throughput and Low Cost Solution for NFC Device Testing On V93000
  Xiaoxiao Wei, Advantest
  MDL Variability in Semiconductor Wafer Analysis: The Critical Role of the Extraction Solution and the Contaminants States
  Sophia Wen, Huaying Research Co.,Ltd
  New Bluetooth Channel Sounding production testing on V93000
  Daniel Sun, Advantest
  SmarTest8 Standard Trim Test Framework
  Xiao Li, Advantest
  Testing SparkLink Low Energy(SLE) Access Mode on V93000
  Daniel Sun, Advantest
  ATPG of AI Test Program
  Yaqiong Mao, Advantest
  Concurrent Testing of Functionally Independent Modules in SIP SoC on V93000
  Rong Tang, Advantest
  A Test Time-Optimized Multi-Lane SERDES Test Method Based on the 93000 ATE Platform
  Ruiqiang Liu, Advantest
  Measurement of Wi-Fi 7 Transceivers Using a Combination of WSRF and WSMX Cards
  Liuhao Chen, Advantest
  Common Test Solutions Realization of Auto-Calibration
  Norris Wang, Advantest
  Study and Application of Probe Factor Calibration for Measuring Near-Field Electromagnetic Interference
  Shangru Han, JCET Group Co., Ltd.
  Fault Isolation using FIB to Mitigate Interference in Failure Analysis Caused by OBIRCH
  Jiwei Zhou, Beijing Xuanjie Technology Co., Ltd. Shanghai First Branch.
  Test Solution for 2M 24 bit High-Speed and High-Precision ADC Chip
  Qinghua Qi, Advantest
  Automotive BMS Chip Testing: Key Test Items and ATE Implementation Case Study
  Qingchuan Ma, Advantest
  A Machine Learning-Based Model for Predicting the Service Life of Short-Wave Light Sources in OCD Tools
  Zhenhao Chen, Shanghai University
  EFUSE Test Specification
  Zhenyan Cao, Advantest
  Prediction of Chip Aging-Induced Vmin Shift Based on SPICE Simulation
  Haiyong Wang, Sanechips Technology Co., Ltd
  Advancing ATE Efficiency: Integration of EXA Scale and SmarTest 8 for APBB Applications
  Felix Chen, Advantest
  BMS Metrology Consistency and In-Service Mutual Recognition: Type Evaluation and ATE Test Coverage Methodology Based on Beijing-Tianjin-Hebei Coordination
  Yan Yang, Tianjin Institute of Metrological Supervision and Testing
  Full Process Control Solutions for High Precision Mass Production of SRG Optical Waveguides in AR/MR Applications
  Hong Hong, Onto Innovation
  Outlier Screening for IC Based on Sparse Multi-Output Gaussian Process Regression
  Haobin Qin, Zhejiang University
  Design and Implementation of DSI3 Interface Test Solution for Automotive Semiconductor Devices
  Kaitao Liu, Advantest
  The Influence of via Over-Etch on the Electromigration of Copper Interconnects
  Yaokai Tang, Shanghai Huali Integrated Circuit Corporation
  A Study on LDD Optimization for HCI Reliability Enhancement in 55nm 3.3v IO NMOS Devices
  Wenfeng Ding, GHS Semiconductor Co., Ltd., Hangzhou, China
  Best Practice of RF Trim for Satellite Moblie Terminal RF Transceiver on V93000
  Bank Liu, ADVANTEST (China)
  Gate Oxide Process Optimization for NBTI suppression in NOR Flash Periphery Devices
  Liyun Wu, GHS semiconductor
  Study of New Stress Migration Failure Modes in Nose Plate Structures of Cu/Low-k Interconnects
  Yuexing Cheng, GHS Semiconductor Co., Ltd
  Combined Vramp and Modeling Analysis of IMD Reliability Assessment
  Bo Yang, GHS
  Optimal Methodology for Chiplet Testing in SmarTest 8
  Haijing Wu, Advantest
  Investigation on the Failure Mechanism of THB Test for Recovering Short Circuit Problems
  Zhonggen Zhang, Sanechips Technology Co., Ltd.
  Analysis of Zero-IF Architecture RF Self-Calibration Solutions Based on V93000 Platform
  Dong Hao, Advantest
  BF2+ Recipes Optimization for High Performance CIS Device
  Hui You, Applied Materials China