| Date: | Monday, March 12, 2018 |
| Venue: | Shanghai International Convention Center |
| Room: | 5F |
|
14:30-15:30
|
CMOS Technology Challenges and Opportunities for FINFET and Beyond Dr. Dechao Guo Sr. Manager, IBM |
|
15:30-16:30
|
BEOL Interconnect Technology: Scaling Trends and Opportunities Dr. Griselda Bonilla Sr. Manager, IBM |
|
16:30-17:30
|
Defect characteristics and yield control for 14nm to 10nm CMOS technology Dr. Kan Chen Sr. Manager, KLA Tencor |
