Keynote & Invited Speakers
Plenary Session
Dr. Leo Esaki, Nobel Laureate, IBM Fellow, Chairman of the Science and Technology Promotion Foundation of Ibaraki, Japan
Dr. Kinam Kim, Samsung Fellow, President and CEO of Samsung Institute of Advanced Technology, Korea
Dr. Luc Van den hove, CEO of IMEC, Belgium
Symposium I: Design and Device Engineering
Keynote Speakers
Chung H. Lam, Distinguished Engineer, IBM, USA
Doris Bruce, IBM, USA
Simon Deleonibus, Director, CEA Research, France
Huili (Grace) Xing, Professor, University of Notre Dame, USA
Invited Speakers
Huiming Bu, IBM, USA
Frederick T. Chen, Deputy R&D Director, ITRI, Taiwan
Jianfu Zhang, Professor, Liverpool John Moores University, UK
Rama Divakaruni, Distinguished Engineer & Chief Technologist for Low Power, IBM, USA
Chee-wee Liu, Professor, National Taiwan University, Taiwan China
Hongyu Yu, Nanyang University of Technology, China
Symposium II: Lithography and Patterning
Keynote Speakers
Vivek Singh, Fellow, Intel Corporation, USA
Ralph Dammel, Fellow, AZ Chemical, USA
Ken Wu, Manager, SMIC, China
Banqiu Wu, CTO, AMAT, USA
Ying Zhang, IBM, USA
Vahid Vahedi, VP, Etch Products, Lam Research Corporation, USA
Invited Speakers
Donis Flagello, NRCA Fellow, Nikon Research Corporation of America, USA
Li Jia, Ph.D. Candidate, The University of Hong Kong, Hong Kong China
Qiang Shu, Senior Engineer, Semiconductor Manufacturing International Corp., China
Andreas Erdmann, Head of Lithography Simulation, Fraunhofer IISB, Germany
Yalin Xiong, VP of Engineering, KLA-Tencor, Canada
Jinyu Zhang, Associate Professor, Institute of Microelectronics, Tsinghua University, China
Yuri Granik, Chief Engineering Scientist, Mentor Graphics, USA
George Barclay, Director, Dow Chemical, USA
Peter Cheang, Marketing Director, ASML, Taiwan China
Linyong Pang, Sr. VP & GM, Luminescent Technologies, Inc., USA
Motokatsu Imai, Manager, Nikon Corporation, Japan
Soichi Inoue, Program Manager, Toshiba, Japan
Benjamin Lin, Lithography Application Director, Cymer Southeast Asia Ltd., Taiwan China
Symposium III: Dry &Wet Etch and Cleaning
Keynote Speakers
Vahid Vahedi, VP, Etch Products, Lam Research Corporation, USA
Dennis W. Hess, Thomas C. DeLoach, Jr. Professor of Chemical & Biomolecular Engineering, Georgia Institute of Technology, USA
Ying Zhang, IBM, USA
Banqiu Wu, CTO, AMAT, USA
Invited Speakers
Erwine Pargon, Researcher, CNRS-LTM, France
Meihua Shen, Sr. Director, Applied Materials, USA
Maxime Darnon, Researcher, CNRS-LTM, France
Takayuki Toshima, Process Technology Senior Director Development HQ, Tokyo Electron Kyushu LTD, Japan
Mukund Srinivasan, VP and GM, Clean Products, Lam Research Corporation, USA
Lee Chen, Principal Engineer, Tokyo Electron America (TEA), USA
Symposium IV: Thin Film Technology
Keynote Speakers
Qikun Xue, Professor/Member of CAS, Dean and Academian, Tsinghua University, China
Chia-Hong Jan, Director, Fellow, Intel, USA
Mikael Östling, Professor, Dean of school of information technilogy of KTH, IEEE fellow, Fellow of Royal Institute, Sweden
Tadahiro Ohmi, Professor, Tohoku University, Japan
Andrew Kummel, Professor, University of California, USA
Invited Speakers
Tony Chiang, Chief Technology Officer, Intermolecular, Inc., USA
Eric M. Vogel, Professor, Georgia Institute of Technology, USA
Zhang Beichao, Assistant Director, Semiconductor Manufacturing International (Shanghai) Corporation, China
Ding Peijun, VP, North Electronic, China
Fu Haiying, Director, Novellus, USA
Er-Xuan Ping, Managing director, Applied Materials, USA
Gouri Sankar Kar, Principal Integration Engineer, Imec, Belgium
Symposium V: CMP and Post-CMP Cleaning
Keynote Speakers
Ken Cadien, Professor, Canada Research Chair, University of Alberta, Canada
Invited Speakers
Ananth Naman, VP, R&D, Cabot Microelectronics Corporation, USA
Cuong Tran, Segment Manager, ATMI, USA
David Huang, Pall Corp., USA
Jin Lu, Micron, USA
Edwin Tseng, Application Technical Manager, Nexplanar, USA
Jin-Goo Park, Professor, Hanyang University, Korea
Ching-Hsun Chao, Senior Scientist, DOW, Taiwan China
Laertis Economikos, Senior Technical Staff Member, IBM, USA
Sidney Huey, Dir., CMP Global Product Marketing, Applied Materials CMP Division, USA
Symposium VI: Materials and Process Integration for Device and Interconnection
Keynote Speakers
Qikun Xue, Professor/Member of CAS, Dean and Academian, Tsinghua University, China
Chia-Hong Jan, Director, Intel, USA
Paul A. Kohl, Professor, Georgia Institute of Technology, USA
Shili Zhang, Professor, Uppsala University, Sweden
Johan Liu, Professor, Chalmers University of Technology, Sweden
Bich-Yen Nguyen, Senior Fellow/Manager, Soitec, USA
Mikael Östling, Professor, Dean of school of information technilogy of KTH, IEEE fellow, Fellow of Royal Institute of Technology,Sweden
Invited Speakers
Leonard Rubin, Scientist, Axcelis Technologies, USA
Edward Yi Chang, Professor, National Chiao Tung University, Taiwan China
Huicai Zhong, Professor, Institute of Microelectronics, Chinese Academy of Sciences, China
Larry Zhao, Research Manager, IMEC, Belgium
Richard (Dick) James, Senior Technology Analyst, Chipworks, Canada
Xiao Sun, Senior Researcher, IMEC, Belgium
Symposium VII: Packaging and Assembly
Keynote Speakers
Takayuki Ohba, Professor, University of Tokyo, Japan
John Lau, Fellow, ITRI, Taiwan China
Paul Enquist, Director, Ziptronicx, USA
Robert Patti, CTO, Tezzaron Semiconductor Corp, USA
Invited Speakers
Paul D Franzon, Professor, NC State University, USA
Ganesh Subbarayan, Professor, Purdue University, USA
Yogendra Joshi, Chair Professor, Georgia Institute of Technology, USA
Eren Kursun, RSM, IBM, USA
Roy Yu, Sr. Egnineer, IBM, USA
Kuan-Neng Chen, Professor, National Chiao Tung University, Taiwan China
Daniel Tracy, Senior Director, SEMI, USA
Symposium VIII: Metrology, Reliability and Testing
Keynote Speakers
R. D. (Shawn) Blanton, Professor, Carnegie Mellon University, USA
David G. Seiler, Division Chief, National Institute of Standards and Technology, USA
Asen Asenov, Prof. of EE,University of Glasgow, UK
Invited Speakers
Qiang Xu, Prof. of CSE, The Chinese University of Hong Kong, China
Yu Huang, Sr. Research Staff, Mentor Graphics Co., USA
Guido Groeseneken, Prof. of Dept. of ESAT, Katholieke Univ. Leuven - IMEC, Belgium
Yoshiyasu Ito, Researcher, Rigaku Corporation, Japan
Xinli Gu, Senoir Director, DFX technology, Huawei Technologies , USA
Symposium IX: Emerging Semiconductor Technologies
Keynote Speakers
Barbara De Salvo, Head of the Advanced Memory Group, CEA-LETI, France
Thomas N. Theis, Program Mangager, New Devices and Architectgures for Computing, IBM, USA
Invited Speakers
Joerg Schulze, Professor, Universität Stuttgart , Germany
Cheol Seong Hwang, Professor, Department of Materials Science and Engineering and Inter-university Semiconductor Research, Seoul National University, South Korea
Jin-Seong Park, Professor, Dankook University, South Korea
Hsiang-Lan Lung, Manager, Integration & Exploration Group Leader, Macronix International Co. Ltd., USA
Koukou Suu, General Manager, ULVAC, Inc, Japan
Debdeep Jena, Professor, Univeristy of Notre Dame, USA
Tom Thieme, Business Development Manager, LayTec AG, Germany
Daniele Ielmini, Professor, Politecnico di Milano, Italy
Keon Jae Lee, Professor, Korea Advanced Institute of Science and Technology (KAIST), Korea
Huili (Grace) Xing, Professor, Univeristy of Notre Dame, USA
Tomi T. Li, Professor, National Central University, Taiwan China
Symposium X:Advances In MEMS and Sensor Technologies
Keynote Speakers
Benedetto Vigna, Group Vice President of Analog, Power, MEMS Group, ST Microelectronics, Italy
Xaiowei Shen, Associate Director, IBM Research, China/USA
Liwei Lin, Chancellor's Professor of the Department of Mechanical Engineering, UC Berkeley, USA
Hans Zappe, Prefossor, Department of Microsystems Engineering, University of Freiburg, Germany
Invited Speakers
Herb Huang, Director, SMIC, China
Liesbet Lagae, Research groupleader of IMEC and associate proferssor of Catholic University Leuven,
IMEC and Catholic University Leuven, Belgium
Xinxin Li, Professor, Shanghai Institute of Microsystems, China
Zewen Liu, Professor, Institute of Microelectronic, Tsinghua University, Beijing
Miao Lu, Professor, Xiamen University, China
Jean Philippe Polizzi, Microsystems Program Manager, CEA-LETI, France
Horst Theuss, Principal, Infineon Technologies, Germany
M. Juergen Wolf, Head of Division HDIWLP/ASSID, Fraunhofer IZM, Germany
Haixia Zhang, Professor, Peking University, China
Zhiyong Li, Principle Investigator, HP Labs, USA
Gregory N. Nielson, Principal Member of Technical Staff, Sandia National Laboratories, USA
Zheyao Wang, Professor, Tsinghua University, China