Sunday, March 15, 2020 Shanghai International Convention Center
Meeting Room：5th Floor Yangtze River Hall
Joint Session: Symposium II and Symposium III-Lithography/Etch
Session Chairs: Kafai Lai & Ying Zhang
| 13:30-13:35 | Opening Remarks |
| Kafai Lai / Ying Zhang | |
| **13:35-14:05 | TBD |
| Shingo Yoshikawa, DNP | |
| **14:05-14:35 | Advanced Memory Patterning Challenges and Perspective Solutions |
| Jeongdong Choe, DRAM | |
| **14:35-15:05 | The Law that Guides the Development of Photolithography Technology and the Methodology in the Design of Photolithographic Process |
| Qiang Wu, ICRD | |
| 15:05-15:20 | Coffee Break |
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