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2018年3月14-16日
上海新国际博览中心

Dr. Kafai LAI

Dr. Kafai LAI
IBM, USA

Kafai Lai received his Bachelor degree from the University of Hong Kong in 1988, and his Master and Doctorate degree from the University of Texas at Austin in 1992 and 1995 respectively, both in Electrical Engineering. Since then he has been working on Lithography development in Connexant, Texas Instruments and Currently in IBM Research Division. He has been involved in optical imaging modeling and lens characterization, exposure tooling analysis, OPC model improvement, and lithography/RET development, Source Mask optimization and Design Technology Co-Optimization and most recently Directed Self-Assembly Lithography in mainstream lithography for a total of around 20 years. He is also the chair of the 2012-2015 SPIE Optical Microlithography Conference and has been a member of the technical program committee & short course instructor of the Conference since 2005. He has also been the symposium chair for the CSTIC conference in Shanghai since 2009. Moreover, he serves as the editor of the Proceedings of SPIE and guest editor for JM3, ECS transactions, the Journal of Advanced Optical Technologies and others. Based on his pioneering work in extending optical lithography and Source Mask Optimization, he was appointed Fellow of SPIE and Fellow of OSA, as well as a senior member of IEEE.