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Tomoki Suemasa
1980; B.S. degree from Niigata University, Niigata Japan
1982; M.S. degree from Gakushuuin University, Tokyo Japan
1982-1995; work with Pioneer Electric Corporation, participated in Semiconductor Process Integration/Design
1995-2016; work with Tokyo Electron, participated in Etch Process/Plasma Source Development, Customer Support in US and Taiwan
2000; Received SEMI Technology Symposium Award 2000 (Etch/Ash Technology for Low-k Dielectrics)
2016-Present; work with Beijing NAURA Microelectronics Equipment Co. Ltd., in charge of Etch Process Development
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